|
Research
Front Name
|
Percentage of corporate affiliations
|
Leading
corporation
|
|
HIGH-PERFORMANCE ENHANCEMENT-MODE ALGAN/GAN HEMTS
FLUORIDE-BASED PLASMA TREATMENT; ALGAN/GAN HIGH
ELECTRON MOBILITY TRANSISTORS; HIGH-POWER ALGAN/GAN
HEMTS; HIGH BREAKDOWN VOLTAGE ALGAN-GAN POWER-HEMT
DESIGN
|
36
|
Cree Inc
|
|
HYDROGEN STORAGE REACTIONS; ENHANCED HYDROGEN STORAGE
KINETICS; NEW HYDROGEN STORAGE MATERIALS; HYDROGEN
STORAGE PERFORMANCES; UNSOLVATED MAGNESIUM BOROHYDRIDE
MG(BH4)(2)
|
27
|
Toyota Industries Corp
|
|
FULLY EPITAXIAL CO/MGO/CO MAGNETIC TUNNEL JUNCTIONS;
SINGLE-CRYSTAL FE/MGO/FE MAGNETIC TUNNEL JUNCTIONS;
COFEB/MGO/COFEB MAGNETIC TUNNEL JUNCTIONS; FULLY
EPITAXIAL FE/MGO/FE TUNNEL JUNCTIONS; GIANT TUNNEL
MAGNETORESISTANCE RATIO
|
30
|
IBM Corp
|
|
5 GBIT/S CARRIER-INJECTION-BASED SILICON MICRO-RING
SILICON MODULATORS; HIGH-SPEED SILICON OPTICAL
MODULATOR; 40 GBIT/S SILICON OPTICAL MODULATOR; SILICON
PHOTONIC CHIP; HIGH SPEED SILICON MACH-ZEHNDER
MODULATOR
|
29
|
Intel Corp
|
|
ROOM TEMPERATURE IONIC LIQUIDS; LI/LICOO2 CELL USING
ROOM TEMPERATURE IONIC LIQUIDS (RTILS); IONIC LIQUID
ELECTROLYTE SYSTEMS; LOW-VISCOSITY IONIC LIQUIDS;
IMPROVED IONIC LIQUID ELECTROLYTE
|
24
|
Nisshinbo Industries, Inc
|
|
ATOMIC LAYER DEPOSITED HIGH-KAPPA GATE DIELECTRICS;
GAAS PASSIVATION USING ATOMIC LAYER-DEPOSITED
HIGH-KAPPA DIELECTRICS; AL2O3 GATE DIELECTRICS; HFO2
GATE DIELECTRICS; THIN GE OXYNITRIDE GATE DIELECTRIC
|
28
|
IBM Corp
|
|
TRANSPARENT FLEXIBLE THIN-FILM TRANSISTORS; AMORPHOUS
OXIDE SEMICONDUCTORS; AMORPHOUS INDIUM GALLIUM ZINC
OXIDE THIN-FILM TRANSISTORS; INDIUM GALLIUM ZINC OXIDE
CHANNEL BASED TRANSPARENT THIN FILM TRANSISTORS
|
23
|
Hewlett Packard Corp
|
|
LOW-RESISTANCE MAGNETIC TUNNEL JUNCTIONS; NANOSCALE
MAGNETIC TUNNEL JUNCTIONS; SPIN-TRANSFER TORQUE;
SPIN-TRANSFER SWITCHING; DOUBLE-POINT-CONTACT
SPIN-TRANSFER DEVICES
|
20
|
Hitachi Global Storage Technologies
|
|
HIGH DIELECTRIC CONSTANT GATE OXIDES; HFO2
HIGH-DIELECTRIC-CONSTANT GATE OXIDE; HIGH-K GATE
DIELECTRIC STACKS; POLYSILICON METAL OXIDE INTERFACE;
HIGH DIELECTRIC CONSTANT OXIDES
|
20
|
Kintech Technol Ltd Kintech Technologies Co, Ltd
|
